he morphology and elemental composition of the zirconium films prepared by thin film pretreatment were analyzed by SEM and EDS,and the influence of the control variables of thin film pretreatment on the amount of zirconium film formation was analyzed.The results showed that the zirconiumbased thin films were mainly composed of Zr and Si elements,and the weight percentages of Zr and Si were2%and 0.2%.The amount of zirconium film formation increased with the increase of temperature,and the variation of the amount of zirconium film formation with temperature in the range of 30~35℃was larger than that in other temperature ranges.When the concentration of zirconium in the treatment solution increased,the amount of zirconium film formation also increased.When the concentration of zirconium increased from 0.2 mg/L to 0.4 mg/L,the increase in zirconium film formation was relatively the largest,with an increase of 10 mg/m~2.Increasing the pH of the treatment solution could also promote zirconium film formation,and when the pH was in the range of 4.5~4.8,the change of zirconium film formation with pH was the most obvious.The amount of zirconium film formation increased gradually with the prolongation of the treatment time,and the film formation speed showed a trend of fast at first and then slow.With the increase of free fluorine in the film treatment solution,the zirconium film formation showed a downward trend,in the range of 15~25 mg/L,the amount of zirconium film was most affected by the change of free fluorine.